When: Feb. 4-March 28 2011
Polaridad Complementaria, developed by Havana’s Centro de Arte Contemporaneo Wifredo Lam, will offer visitors to the City Gallery the chance to experience the next generation of Cuban artists and the island’s artistic aesthetic. Twenty-four artists will present more than 40 works of art, ranging from paintings, drawings, and sculptures to photography, video, and installation art. The exhibition, part of the International Arts & Artists tour, focuses on global concerns in a local context while opening a channel for dialogue and cultural exchange between Cuba and the U.S. The internationally recognized artists are able to address international and local social issues. René Peña, for example, explores struggles with cultural and individual identity through a unique use of light in his photographs. Technology in the third-world is examined by Abel Barroso’s 3-D pieces of wood and printing methods. Duvier del Dago highlights the unattainable by combining drawings and 3-D handmade designs. Polaridad Complementaria will be on display until March 28 before continuing to the last spot on its tour.